Measurement of mode field profiles and bending and transition losses in curved optical channel waveguides

Author

Subramaniam, Vijaya ; De Brabander, Gregory N. ; Naghski, David H. ; Boyd, Joseph T.

Author_Institution

Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA

Volume

15

Issue

6

fYear

1997

fDate

6/1/1997 12:00:00 AM

Firstpage

990

Lastpage

997

Abstract

Curved, single-mode, silicon oxynitride optical ridge channel waveguides have been characterized by measuring mode field profile alteration, bending loss, and transition loss. The results were compared to theoretical calculations. Near field imaging of the channel mode field profiles showed the effect of bend radius on mode shape. Good agreement was obtained between the measurements and profiles obtained from two-dimensional (2-D) beam propagation method calculations. The exponential dependence of bending loss on bend radius and the variation of transition loss on the lateral offset between channels having different bend radius were successfully modeled by two simple theories

Keywords

bending; integrated optics; optical loss measurement; optical waveguide theory; optical waveguides; ridge waveguides; silicon compounds; 2D beam propagation method calculations; bend radius; bending loss measurement; channel mode field profiles; curved optical channel waveguides; exponential dependence; integrated optics; lateral offset; mode field profile alteration; mode field profiles; mode shape; near field imaging; silicon oxynitride optical ridge channel waveguides; transition loss; transition losses; Computer science; Integrated optics; Loss measurement; Optical interconnections; Optical losses; Optical propagation; Optical waveguide theory; Optical waveguides; Two dimensional displays; Waveguide transitions;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.588672

Filename

588672