DocumentCode :
1556529
Title :
Comment on "Effect of radiation and surface recombination on the characteristics of an ion-implanted GaAs MESFET
Author :
Chakrabarti, P.
Author_Institution :
Dept. of Electron. & Commun. Eng., Birla Inst. of Technol., Ranchi, India
Volume :
38
Issue :
11
fYear :
1991
Firstpage :
2578
Abstract :
For the original article see ibid., vol.37, no.1, p.2-10 (1990). In an attempt to investigate the effect of radiation and surface recombination on an ion implanted GaAs MESFET, S. Mishra et al., the authors of the above-titled paper, developed a closed-form analytical model of the device under illuminated condition. It is argued by the commenter that an incorrect I-V relation of the device in the illuminated condition was derived and that, therefore, the I-V relation obtained by the authors is incorrect. It is also suggested that a true I-V relation of the device in the illuminated condition can only be obtained after expressing the total charge explicitly as a function of channel voltage.<>
Keywords :
III-V semiconductors; Schottky gate field effect transistors; electron-hole recombination; gallium arsenide; ion implantation; radiation effects; semiconductor device models; GaAs; I-V relation; an ion-implanted GaAs MESFET; channel voltage; closed-form analytical model; illuminated condition; radiation; surface recombination; total charge; Analytical models; Electron devices; Gallium arsenide; Ion implantation; MESFETs; Spontaneous emission; Surface treatment; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.97431
Filename :
97431
Link To Document :
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