High-Entropy Alloys Deposited by Magnetron Sputtering

We have studied the deposition of AlCoCrCuFeNi high-entropy alloy thin films on Si (100) substrates by a dc magnetron sputtering process. Three mosaic targets have been used for easily tailoring the film composition. Chemical compositions can be modified around the nominal value by tuning the ratio of the powers applied to the magnetron targets. The deposition rate is directly related to the power sum. Moreover, various surface morphologies have been evidenced by scanning electron microscopy and correlated to the crystalline phases present in the films. Morphology and crystalline structure have been found to depend on the chemical composition.