DocumentCode :
1557160
Title :
Determining dominant breakdown mechanisms in InP HEMTs
Author :
Somerville, Mark H. ; Putnam, Chris S. ; del Alamo, Jesús A.
Author_Institution :
Franklin W. Olin Coll. of Eng., Needham Heights, MA, USA
Volume :
22
Issue :
12
fYear :
2001
Firstpage :
565
Lastpage :
567
Abstract :
We present a new technique for determining the dominant breakdown mechanism in InAlAs-InGaAs high-electron mobility transistors. By exploiting both the temperature dependence and the bias dependence of different physical mechanisms, we are able to discriminate impact ionization gate current from tunneling and thermionic field emission gate current in these devices. Our results suggest that the doping level of the supply layers plays a key role in determining the relative importance of these two effects.
Keywords :
III-V semiconductors; aluminium compounds; electric current; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; semiconductor device breakdown; semiconductor device measurement; thermionic emission; tunnelling; HEMT; InAlAs-InGaAs; InAlAs-InGaAs high-electron mobility transistors; InP; InP HEMTs; bias dependence; dominant breakdown mechanisms; doping level; impact ionization gate current; physical mechanisms; supply layers; temperature dependence; thermionic field emission gate current; tunneling gate current; Doping; Electric breakdown; HEMTs; Impact ionization; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Temperature dependence; Tunneling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.974578
Filename :
974578
Link To Document :
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