DocumentCode :
1557206
Title :
The effect of change of voltage acceleration on temperature activation of oxide breakdown for ultrathin oxides
Author :
Wu, E.Y. ; McKenna, J.M. ; Lai, W. ; Nowak, E. ; Vayshenker, A.
Author_Institution :
Microelectron. Div., IBM, Essex Junction, VT, USA
Volume :
22
Issue :
12
fYear :
2001
Firstpage :
603
Lastpage :
605
Abstract :
We report the effect of change of voltage acceleration on temperature dependence of oxide breakdown for ultra-thin oxides below 6 nm. The time- or charge-to-breakdown (T/sub BD//Q/sub BD/) is directly measured over a wide range of temperatures (-30/spl deg/C to 200/spl deg/C) for several fixed voltages using different area capacitors and long-term stress. Using extensive experimental evidence, we unequivocally demonstrate that this strong temperature dependence of oxide breakdown on ultra-thin oxides is not a thickness effect as previously suggested at least for thickness range investigated in this work. It is a consequence of two experimental facts: 1) voltage-dependent voltage acceleration and 2) temperature-independent voltage acceleration within a fixed T/sub BD/ window. These results provide a coherent picture for T/sub BD/ in both voltage and temperature domains for ultra-thin oxides.
Keywords :
MOS capacitors; dielectric thin films; electric breakdown; semiconductor device breakdown; semiconductor device reliability; -30 to 200 C; 1.7 to 5.0 nm; CMOS process; MOS capacitors; NFET devices; Si-SiO/sub 2/; charge-to-breakdown; dielectric breakdown; long-term stress; p/sup +/poly/n-Si capacitors; reliability testing; temperature activation of oxide breakdown; temperature dependence; temperature-independent voltage acceleration; time-to-breakdown; ultra-large-scale integration; ultrathin oxides; voltage acceleration; voltage-dependent voltage acceleration; Acceleration; Area measurement; Breakdown voltage; Capacitors; Current measurement; Electric breakdown; Q measurement; Stress measurement; Temperature dependence; Temperature distribution;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.974592
Filename :
974592
Link To Document :
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