Far-end crosstalk reduction in double-layered dielectric interconnects

Author

Gazizov, Talgat R.

Author_Institution

Telev. & Control Dept., Tomsk State Univ., Russia

Volume

43

Issue

4

fYear

2001

fDate

11/1/2001 12:00:00 AM

Firstpage

566

Lastpage

572

Abstract

The problem of far-end crosstalk reduction is considered. Various cases of far-end crosstalk reduction in single and cascaded sections of two coupled interconnects in a double-layered dielectric environment are investigated by computer modeling of capacitive and inductive couplings and by simulation of far-end crosstalk waveforms

Keywords

capacitance; coupled transmission lines; crosstalk; dielectric materials; digital simulation; electrical engineering computing; electromagnetic compatibility; electromagnetic coupling; electromagnetic induction; interconnections; microstrip lines; EMC; capacitive coupling; computer modeling; coupled interconnects; coupled inverted microstrip lines; coupled lines; coupled suspended microstrip lines; double-layered dielectric; double-layered dielectric interconnects; far-end crosstalk reduction; far-end crosstalk waveforms simulation; inductive coupling; Conducting materials; Conductors; Coupling circuits; Crosstalk; Dielectric losses; Dielectric substrates; Integrated circuit interconnections; Microstrip; Multiconductor transmission lines; Radio control;

fLanguage

English

Journal_Title

Electromagnetic Compatibility, IEEE Transactions on

Publisher

ieee

ISSN

0018-9375

Type

jour

DOI

10.1109/15.974636

Filename

974636