DocumentCode :
1557477
Title :
Optical Properties of A-Plane InGaN/GaN Multiple Quantum Wells Grown on Nanorod Lateral Overgrowth Templates
Author :
Huang, Huei-Min ; Ling, Shih-Chun ; Chan, Wei-Wen ; Lu, Tien-Chang ; Kuo, Hao-Chung ; Wang, Shing-Chung
Author_Institution :
Dept. of Photonics & Inst. of Electro-Opt. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
47
Issue :
8
fYear :
2011
Firstpage :
1101
Lastpage :
1106
Abstract :
A-plane InGaN/GaN multiple-quantum wells (MQWs) were grown on a series of nanorod epitaxial lateral overgrowth (NRELOG) templates with varied nanorod depth. Optical properties of these samples were investigated by excitation power and temperature-dependent photoluminescence (PL). Due to the absence of quantum-confined Stark effect, the negligible PL emission peak shift and nearly identical power index for all samples were observed. In contrast to the as-grown MQWs, the thermal activation energy and internal quantum efficiency of NRELOG MQWs exhibit 1.6-fold and 4-fold increases, respectively, which are attributed to the improvement of crystal quality by NRELOG. Furthermore, the Shockley-Read-Hall nonradiative coefficient, determined from the fits of power-dependent PL quantum efficiency, is also apparently reduced while MQWs are grown on NRELOG GaN template. The results show the feasibility to fabricate high radiative efficiency a-plane devices via NRELOG.
Keywords :
III-V semiconductors; Stark effect; epitaxial growth; gallium compounds; indium compounds; photoluminescence; semiconductor growth; semiconductor quantum wells; wide band gap semiconductors; A-plane multiple quantum wells; InGaN-GaN; Shockley-Read-Hall nonradiative coefficient; Stark effect; excitation power; nanorod epitaxial lateral overgrowth templates; optical properties; temperature-dependent photoluminescence; thermal activation energy; Epitaxial growth; Etching; Gallium nitride; Light emitting diodes; Quantum well devices; Radiative recombination; Temperature measurement; A-plane; InGaN/GaN multiple quantum wells; internal quantum efficiency; nanorod lateral epitaxial overgrowth;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.2011.2158632
Filename :
5892865
Link To Document :
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