Title :
Proportional difference estimate method for bimodal and multimodal failure distributions
Author :
Mu, Fuchen ; Tan, Changhua ; Xu, Mingzhen
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fDate :
12/1/2001 12:00:00 AM
Abstract :
Peaks appear after proportional differentiation of cumulative distribution functions of Weibull and lognormal distributions. The characteristic parameters can be extracted from the proportional difference peaks because these peaks are related to the characteristic parameters directly. On this basis, a simple method known as the proportional difference estimate (PDE) method for determining the characteristic parameters of multimodal failure distributions was developed. This method can be applied to microelectronics dielectric and interconnect reliability studies
Keywords :
Weibull distribution; dielectric thin films; difference equations; electromigration; failure analysis; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; log normal distribution; PDE method; Weibull distributions; bimodal failure distributions; characteristic parameter extraction; characteristic parameters; cumulative distribution functions; dielectric reliability; electromigration; interconnect reliability; lognormal distributions; multimodal failure distributions; proportional difference estimate; proportional difference estimate method; proportional difference operator; proportional difference peaks; proportional differentiation; time-dependent dielectric breakdown; Algorithm design and analysis; Dielectric breakdown; Distribution functions; Electric breakdown; Extrapolation; Graphics; Maximum likelihood estimation; Shape; Statistical distributions; Weibull distribution;
Journal_Title :
Electron Devices, IEEE Transactions on
