Scaling characteristics of plasma parameters for low-pressure oxygen RF discharge plasmas

Author

Chung, T.H. ; Seo, D.C. ; Kim, G.H. ; Kim, J.S.

Author_Institution

Dept. of Phys., Dong-A Univ., Pusan, South Korea

Volume

29

Issue

6

fYear

2001

fDate

12/1/2001 12:00:00 AM

Firstpage

970

Lastpage

973

Abstract

For a low-pressure (1-100 mtorr) oxygen RF discharge plasma, the scaling laws for the densities of charged species such as positive ion, negative ion, and electron are estimated in terms of external and internal plasma parameters for the ion-flux-loss-dominated region based on the global balance equations. The scaling formulas are compared with Langmuir probe measurement results performed on a planar inductively coupled oxygen plasma. The transition point from the ion-flux-loss-dominated region to the recombination-loss-dominated region moves to a lower pressure region as the absorbed power increases

Keywords

Langmuir probes; high-frequency discharges; ion density; negative ions; oxygen; plasma collision processes; plasma density; plasma temperature; plasma transport processes; positive ions; 1 to 100 mtorr; Langmuir probe measurement results; O; O RF discharge plasmas; RF discharge plasma; absorbed power; charged species; densities; electrons; external plasma parameters; global balance equations; internal plasma parameters; ion-flux-loss-dominated region; low-pressure RF discharge plasmas; low-pressure discharge; negative ions; planar inductively coupled plasma; plasma parameters; positive ions; recombination-loss-dominated region; scaling characteristics; scaling formulas; scaling laws; transition point; Electrons; Metastasis; Oxygen; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature; Radio frequency;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.974987

Filename

974987