Effect of the Surface Bond States in as-Deposited DLC Films on the Incorporation of Nitrogen and Oxygen Atoms

Author

Nitta, Yuki ; Okamoto, Keishi ; Nakatani, Tatsuyuki ; Shinohara, Masanori

Author_Institution

TOYO Adv. Technol. Co., Ltd., Hiroshima, Japan

Volume

40

Issue

8

fYear

2012

Firstpage

2073

Lastpage

2078

Abstract

We have investigated the relation of bonding states in as-deposited diamond-like carbon (DLC) films and the incorporation of N and O atoms into DLC films, following plasma treatment of the surface. After deposition with various coating methods and under different conditions, the DLC films were treated with NH₃ or O₂ plasma. We investigated the changes in bonding states of the films using X-ray photoelectron spectroscopy (XPS). The results suggested that the incorporation due to plasma treatment was affected by the bonding states in the as-deposited DLC films. The C-H/C-C and the sp² C-C/sp³ C-C ratios in the as-deposited DLC films play an important role in controlling N and O incorporation into the DLC films.

Keywords

X-ray photoelectron spectra; diamond-like carbon; nitrogen; oxygen; plasma deposited coatings; plasma materials processing; C-H-C-C ratios; NH₃ plasma treatment; O₂ plasma treatment; X-ray photoelectron spectroscopy; as-deposited DLC films; as-deposited diamond-like carbon films; bonding states; coating methods; nitrogen atom incorporation; oxygen atom incorporation; sp² C-C-sp³ C-C ratios; surface bond state effect; surface plasma treatment; Atomic layer deposition; Bonding; Films; Hydrogen; Plasmas; Radio frequency; Surface treatment; Diamond-like carbon (DLC); plasma surface treatment; surface structure;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2012.2203613

Filename

6243216