Symmetrical waveguide devices fabricated by direct UV writing

Author

Færch, Kjartan ; Svalgaard, Mikael

Author_Institution

COM Center, Tech. Univ. Denmark, Lyngby, Denmark

Volume

14

Issue

2

fYear

2002

Firstpage

173

Lastpage

175

Abstract

Power splitters and directional couplers fabricated by direct UV writing in index matched silica-on-silicon samples can suffer from an asymmetrical device performance, even though the UV writing is carried out in a symmetrical fashion. This effect originates from a reduced photosensitivity in the vicinity of previous exposed areas. The imbalance can be counteracted by an appropriate reduction of the applied scan velocity in areas, where a previous scan has been carried out nearby.

Keywords

optical directional couplers; optical fabrication; optical losses; optical planar waveguides; refractive index; ultraviolet lithography; UV-induced refractive index change; applied scan velocity reduction; buried channel waveguides; direct UV writing; directional couplers; index matched silica-on-silicon; insertion loss; polarization-dependent loss; power splitters; reduced photosensitivity; symmetrical waveguide devices; Directional couplers; Loss measurement; Optical buffering; Optical devices; Optical fiber polarization; Optical refraction; Optical variables control; Optical waveguides; Waveguide lasers; Writing;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.980496

Filename

980496