DocumentCode
1559763
Title
Design and fabrication of SiO2/Si3N4 integrated-optics waveguides on silicon substrates
Author
Bulla, Douglas Anderson Pereira ; Borges, Ben-Hur Viana ; Romero, Murilo Araujo ; Morimoto, Nilton Itiro ; Neto, Luiz Gonçalves
Author_Institution
Escola Politecnica, Sao Paulo Univ., Brazil
Volume
50
Issue
1
fYear
2002
fDate
1/1/2002 12:00:00 AM
Firstpage
9
Lastpage
12
Abstract
In this paper, the design and fabrication of silicon-based optical waveguides are revisited. The goal is to develop a novel design and deposition process to minimize leakage losses. Interface roughness and Si3N4 stoichiometry are examined. The optical loss is measured and contributions from scattering and absorption are determined
Keywords
chemical vapour deposition; elemental semiconductors; integrated optics; interface roughness; optical fabrication; optical losses; optical waveguides; silicon; silicon compounds; substrates; LPCVD; Si; Si substrates; Si-based optical waveguides; Si3N4 stoichiometry; SiO2-Si3N4; SiO2/Si3N4 integrated-optics waveguides; TEOS PECVD; absorption; chemical vapor deposition; deposition process; interface roughness; leakage losses; low-pressure CVD; optical loss; plasma-enhanced CVD; scattering; waveguide fabrication; Electromagnetic waveguides; Optical device fabrication; Optical films; Optical losses; Optical refraction; Optical scattering; Optical variables control; Optical waveguides; Silicon; Substrates;
fLanguage
English
Journal_Title
Microwave Theory and Techniques, IEEE Transactions on
Publisher
ieee
ISSN
0018-9480
Type
jour
DOI
10.1109/22.981236
Filename
981236
Link To Document