• DocumentCode
    1559817
  • Title

    A study of parasitic effects of ESD protection on RF ICs

  • Author

    Gong, Ke ; Feng, Haigang ; Zhan, Rouying ; Wang, Albert Z H

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Illinois Inst. of Technol., Chicago, IL, USA
  • Volume
    50
  • Issue
    1
  • fYear
    2002
  • fDate
    1/1/2002 12:00:00 AM
  • Firstpage
    393
  • Lastpage
    402
  • Abstract
    This paper presents a comprehensive study on influences of on-chip electro-static discharge (ESD) protection structures on performance of the circuits being protected. Two novel compact low-parasitic ESD structures were designed for RF and mixed-signal (MS) integrated circuits. Parasitic models of the ESD structures are extracted. RF building-block circuits, including a low-power high-speed op amp and a fully integrated 2.4-GHz low-noise amplifier were designed in 0.18/0.35-μm technologies. Investigation of performance of these circuits under influences of the two new ESD protection structures and traditional MOS ESD protection device, in both copper and aluminum interconnects, demonstrated that significant circuit performance degradation (~30%) occur when using NMOS ESD protection in Al technology, which recovered substantially (~80%) when using low-parasitic ESD protection in Cu technology. This work indicates that the ESD-to-circuit influence is inevitable and substantial. Therefore, novel low-parasitic ESD protection solution is essential to maintaining both circuit functionality and ESD robustness in RF and MS applications
  • Keywords
    CMOS analogue integrated circuits; UHF amplifiers; UHF integrated circuits; electrostatic discharge; integrated circuit modelling; integrated circuit noise; operational amplifiers; 2.4 GHz; CMOS technology; ESD protection; ESD robustness; RFICs; grounded-gate format; low-noise amplifier; low-power high-speed op amp; mixed-signal integrated circuits; model extraction; noise models; on-chip protection structures; parasitic effects; simulation-design methodology; Aluminum; Copper; Electrostatic discharge; Integrated circuit interconnections; Integrated circuit technology; Low-noise amplifiers; Operational amplifiers; Protection; Radio frequency; Radiofrequency integrated circuits;
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/22.981291
  • Filename
    981291