DocumentCode :
1559858
Title :
Handbook of advanced plasma processing techniques [Book Review]
Author :
Shea, John
Volume :
18
Issue :
1
fYear :
2002
Firstpage :
48
Lastpage :
48
Keywords :
Book reviews; Dry etching; III-V semiconductor materials; Magnetic materials; Plasma applications; Plasma chemistry; Plasma diagnostics; Plasma materials processing; Plasma properties; Plasma sources;
fLanguage :
English
Journal_Title :
Electrical Insulation Magazine, IEEE
Publisher :
ieee
ISSN :
0883-7554
Type :
jour
DOI :
10.1109/MEI.2002.981331
Filename :
981331
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1559858
