DocumentCode
1559858
Title
Handbook of advanced plasma processing techniques [Book Review]
Author
Shea, John
Volume
18
Issue
1
fYear
2002
Firstpage
48
Lastpage
48
Keywords
Book reviews; Dry etching; III-V semiconductor materials; Magnetic materials; Plasma applications; Plasma chemistry; Plasma diagnostics; Plasma materials processing; Plasma properties; Plasma sources;
fLanguage
English
Journal_Title
Electrical Insulation Magazine, IEEE
Publisher
ieee
ISSN
0883-7554
Type
jour
DOI
10.1109/MEI.2002.981331
Filename
981331
Link To Document