Title :
Polarisation control in VCSELs by elliptic surface etching
Author :
Unold, H.J. ; Riedl, M.C. ; Michalzik, R. ; Ebeling, K.J.
Author_Institution :
Dept. of Optoelectronics, Ulm Univ., Germany
fDate :
1/17/2002 12:00:00 AM
Abstract :
850 nm-wavelength vertical-cavity surface-emitting lasers (VCSELs) with an elliptical shallow surface relief having various aspect ratios and orientations have been fabricated. Using appropriate etch dimensions, VCSELs of up to 12.5 μm active diameter are forced to operate on the fundamental mode for a certain current range. By aligning the longer axis of the etched ellipse with the [011] or [011¯] crystal axis, the polarisation of the fundamental mode is pinned accordingly with a polarisation suppression ratio of ~30 dB
Keywords :
etching; laser modes; light polarisation; optical fabrication; quantum well lasers; surface emitting lasers; 12.5 micron; 850 nm; Al0.1Ga0.9As; GaAs-Al0.98Ga0.02As; VCSEL; [011¯] crystal axis; [011] crystal axis; aspect ratios; current range; elliptic surface etching; elliptical shallow surface relief; etch dimensions; etched ellipse; fundamental mode; longer axis alignment; orientations; polarisation control; polarisation suppression ratio; vertical-cavity surface-emitting lasers;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20020040
