Title :
Development of a very high efficiency, dot-junction, InGaAs thermophotovoltaic (TPV) converter for deep space missions
Author :
Sinharoy, Samar ; Weizer, V.G. ; Wakchaure, Yogesh ; Su, Ning ; Fay, Patrick ; Scheiman, David
Author_Institution :
Essential Res. Inc., Cleveland, OH, USA
Abstract :
Simplified modeling calculations have shown that for a bandgap of 0.6 eV, assuming a conservative 20% planar device conversion efficiency (1800 °F blackbody source), a non-planar In0.69Ga0.31As TPV cell with micron size pn dot-junction geometry will result in conversion efficiencies of 30%, or almost four times the efficiency of traditional thermoelectric conversion systems. As an initial proof of principle demonstration of this technology, we have designed, processed, and tested a 0.74 eV In0.53Ga0.47As dot-junction cell. The 3.0 μm n-InGaAs dots, separated by a 30.0 μm floating junction region, were photolithographically defined on a p-InGaAs layer on a p-InP substrate. In this initial design, the n-contact, grid fingers, and the bussbar were on the top surface where the light was incident, resulting in a 13.3% grid-shadowing effect. The p-contact was at the bottom surface of the substrate. Tested under AM0 one sun condition using a solar simulator, this first attempt showed an efficiency of 6.93%, with a fill factor of 71.6%. Further improvements are expected with proper passivation of the free surface of the p-type base region. In the final design, both the n- and p-contacts will be defined on the epitaxial layer, with radiation incident through the transparent InP substrate.
Keywords :
III-V semiconductors; aerospace instrumentation; electrical contacts; energy gap; gallium arsenide; indium compounds; passivation; photolithography; semiconductor epitaxial layers; semiconductor junctions; semiconductor quantum dots; surface treatment; thermophotovoltaic cells; 1800 degF; 20 percent; 3.0 mum; 30 percent; 30.0 mum; 6.93 percent; AM0 one sun condition; InGaAs TPV converter; InGaAs thermophotovoltaic converter; InGaAs-InP; InP; InP substrate; bandgap; blackbody source; bussbar; conversion efficiency; deep space missions; dot-junction cell; epitaxial layer; fill factor; floating junction region; grid fingers; grid-shadowing effect; micron size pn dot-junction geometry; n-contact; nonplanar In0.69Ga0.31As TPV cell; p-contact; p-type base region; passivation; photolithographically; planar device conversion efficiency; solar simulator; thermoelectric conversion systems; Geometry; Indium gallium arsenide; Photonic band gap; Process design; Solid modeling; Space missions; Substrates; Testing; Thermoelectric devices; Thermoelectricity;
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
Print_ISBN :
0-7803-8707-4
DOI :
10.1109/PVSC.2005.1488245