DocumentCode
1561049
Title
Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000
Author
Sopori, Bhushan ; Amieva, Juana ; Butterfield, Brian ; Li, Chuan
Author_Institution
Nat. Renewable Energy Lab., Golden, CO, USA
fYear
2005
Firstpage
943
Lastpage
946
Abstract
A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map is generated in <100 ms.
Keywords
CCD image sensors; antireflection coatings; elemental semiconductors; silicon; solar cells; thickness measurement; CCD camera; GT-FabScan 6000; Si; antireflection coating; coating thickness; filtered image; mapping; reflectance image; solar cells; thickness image; Coatings; Hydrogen; Metallization; Optical films; Passivation; Photovoltaic cells; Reflectivity; Refractive index; Solar power generation; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
ISSN
0160-8371
Print_ISBN
0-7803-8707-4
Type
conf
DOI
10.1109/PVSC.2005.1488287
Filename
1488287
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