Large-area, light-weight, flexible solar cell production technology: ready for market entry

Author

Tanda, Masayuki ; Tabuchi, Katsuya ; Uno, Masayoshi ; Kato, Shinji ; Takeda, Yukio ; Iwasaki, Shinji ; Yokohama, Y. ; Wada, Takehito ; Shimosawa, Makoto ; Sakakibara, Yasushi ; Takano, Akihiro ; Nishihara, Hironori ; Enomoto, Hirofumi ; Kamoshita, Tomoyos

Author_Institution

Fuji Electr. Adv. Technol. Co., Ltd., Yokosuka, Japan

fYear

2005

Firstpage

1560

Lastpage

1563

Abstract

We have been developing roll-to-roll production technologies of amorphous-silicon solar cell on plastic-film substrates. In this paper, newly developed deposition methods of (1) excitation-frequency controlled plasma-enhanced chemical vapor deposition of amorphous silicon, (2) selective reactive sputtering of metal electrode with low substrate temperature and (3) deposition of large-area uniform transparent conductive oxide are described. The solar cells were applied to 4 m-long light-weight and large-area building-integrated modules.

Keywords

amorphous semiconductors; elemental semiconductors; indium compounds; plasma CVD; semiconductor device manufacture; silicon; solar cells; sputter deposition; 4 m; ITO; InSnO; Si; amorphous-silicon solar cell; excitation-frequency controlled plasma-enhanced chemical vapor deposition; metal electrode; plastic-film substrates; roll-to-roll production technologies; selective reactive sputtering; solar cell production technology; substrate temperature; transparent conductive oxide; Amorphous silicon; Chemical technology; Chemical vapor deposition; Electrodes; Photovoltaic cells; Plasma chemistry; Plasma temperature; Production; Sputtering; Temperature control;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE

ISSN

0160-8371

Print_ISBN

0-7803-8707-4

Type

conf

DOI

10.1109/PVSC.2005.1488442

Filename

1488442