• DocumentCode
    156345
  • Title

    Electrochemical formation of through thickness anodic alumina structures with embedded aluminum elements

  • Author

    Shimanovich, D.L.

  • Author_Institution
    Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
  • fYear
    2014
  • fDate
    7-13 Sept. 2014
  • Firstpage
    680
  • Lastpage
    681
  • Abstract
    Technological features for the formation of free anodic nanoporous Al2O3 structures and 5-100 μm thick embedded aluminum elements simultaneously by a two-sided through thickness electrochemical anodization were studied. It was proved that the thickness of the free alumina plate, the distribution and sizes of the interconnection system in its volume were varied by technological conditions.
  • Keywords
    alumina; electroforming; interconnections; nanofabrication; nanoporous materials; Al2O3; embedded aluminum elements; free alumina plate thickness; free anodic nanoporous alumina structure formation; interconnection system distribution; interconnection system sizes; size 5 mum to 100 mum; technological conditions; through thickness anodic alumina structures; two-sided through thickness electrochemical anodization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference
  • Conference_Location
    Sevastopol
  • Print_ISBN
    978-966-335-412-5
  • Type

    conf

  • DOI
    10.1109/CRMICO.2014.6959582
  • Filename
    6959582
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=156345