Title :
Effectively Reducing the CoO & Minimized PFC Emission by Successful Evaluating CVD Alternative Cleaning Gas, Zyron® c-C4F8
Author :
Hsu, J.M. ; Chen, Mei ; Kuo, Y.C. ; Lee, T.T. ; Loh, Gabriel
Author_Institution :
United Microelectron. Corp., Hsinchu
Abstract :
In this paper, we illustrate the successful replacement of C3F8 with Zyronreg c-C4F8according to its high utilization efficiency in the PECVD chamber-cleaning process, which results in substantially reduced manufacturing costs, cleaning time and perfluorocarbon (PFC) emissions, by an effective and complete evaluation method with DOE matrix in Novellus Concept-2 tools. During the qualifying, we also proved the results are consistent with the IPCC 2006 official announcement of gases properties and concurrently mitigated the abasement system loading of the PFC emissions treatment.
Keywords :
environmental factors; plasma CVD; CVD alternative cleaning gas; DOE matrix; Novellus Concept-2 tools; PFC emission; PFC emissions treatment; abasement system loading; chamber-cleaning process; gas properties; perfluorocarbon emissions; substantially reduced manufacturing costs; utilization efficiency; Carbon dioxide; Cleaning; Costs; Gases; Global warming; IEEE news; Manufacturing processes; Microelectronics; Pulp manufacturing; US Department of Energy;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2008.4529016
