Title :
High Resolution Monitoring of Implant and Anneal Uniformity Using Therma-Probe Technology
Author :
Shaughnessy, Derrick ; Mirshad, Iad ; Salnik, Alex ; Nicolaides, Lena
Author_Institution :
KLA-Tencor Corp., San Jose, CA
Abstract :
A new advanced application of the therma-probe systems for high-resolution mapping of implant and anneal non-uniformities is described.
Keywords :
annealing; process monitoring; anneal uniformity; high resolution mapping; high resolution monitoring; implant uniformity; therma-probe technology; Annealing; High-resolution imaging; Image resolution; Implants; Manufacturing processes; Metrology; Monitoring; Optical imaging; Optical modulation; Signal resolution;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2008.4529039
