• DocumentCode
    1564601
  • Title

    High Resolution Monitoring of Implant and Anneal Uniformity Using Therma-Probe Technology

  • Author

    Shaughnessy, Derrick ; Mirshad, Iad ; Salnik, Alex ; Nicolaides, Lena

  • Author_Institution
    KLA-Tencor Corp., San Jose, CA
  • fYear
    2008
  • Firstpage
    134
  • Lastpage
    135
  • Abstract
    A new advanced application of the therma-probe systems for high-resolution mapping of implant and anneal non-uniformities is described.
  • Keywords
    annealing; process monitoring; anneal uniformity; high resolution mapping; high resolution monitoring; implant uniformity; therma-probe technology; Annealing; High-resolution imaging; Image resolution; Implants; Manufacturing processes; Metrology; Monitoring; Optical imaging; Optical modulation; Signal resolution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4244-1964-7
  • Electronic_ISBN
    1078-8743
  • Type

    conf

  • DOI
    10.1109/ASMC.2008.4529039
  • Filename
    4529039
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1564601