DocumentCode :
156469
Title :
Simulation of the influence of impact ionization process on the current noise in deep submicron silicon diode
Author :
Borzdov, A.V. ; Borzdov, V.M. ; Busliuk, V.V.
Author_Institution :
Belarusian State Univ., Minsk, Belarus
fYear :
2014
fDate :
7-13 Sept. 2014
Firstpage :
805
Lastpage :
806
Abstract :
Ensemble Monte Carlo simulation has been used to simulate charge carrier transport in the deep submicron silicon diode with n+-n-n+ structure. The influence of impact ionization process on static current-voltage characteristics as well as current noise has been studied.
Keywords :
Monte Carlo methods; impact ionisation; semiconductor device models; semiconductor diodes; silicon; Monte Carlo simulation; charge carrier transport; current noise; deep submicron silicon diode; impact ionization process; static current-voltage characteristic; Educational institutions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-966-335-412-5
Type :
conf
DOI :
10.1109/CRMICO.2014.6959640
Filename :
6959640
Link To Document :
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