• DocumentCode
    1564709
  • Title

    Spatial Patterns in Sort Wafer Maps and Identifying Fab Tool Commonalities

  • Author

    Pierre, Eric R St ; Tuv, Eugene ; Borisov, Alexander

  • Author_Institution
    Intel Corp., Chandler, AZ
  • fYear
    2008
  • Firstpage
    268
  • Lastpage
    272
  • Abstract
    Methodologies for detecting non random spatial patterns on Sort bin wafer maps and discovering their fab tool commonalities are presented. The challenges encountered in implementing modern statistical learning algorithms for this task are discussed as well as their advantages over traditional methods. The methods are then demonstrated on production data.
  • Keywords
    integrated circuit manufacture; production engineering computing; software tools; statistical analysis; fab tool commonalities; sort wafer maps; spatial patterns; statistical learning algorithms; Analysis of variance; Clustering algorithms; Libraries; Production facilities; Software algorithms; Software tools; Space technology; Statistical analysis; Statistical learning; Supervised learning;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4244-1964-7
  • Electronic_ISBN
    1078-8743
  • Type

    conf

  • DOI
    10.1109/ASMC.2008.4529051
  • Filename
    4529051