DocumentCode
1564709
Title
Spatial Patterns in Sort Wafer Maps and Identifying Fab Tool Commonalities
Author
Pierre, Eric R St ; Tuv, Eugene ; Borisov, Alexander
Author_Institution
Intel Corp., Chandler, AZ
fYear
2008
Firstpage
268
Lastpage
272
Abstract
Methodologies for detecting non random spatial patterns on Sort bin wafer maps and discovering their fab tool commonalities are presented. The challenges encountered in implementing modern statistical learning algorithms for this task are discussed as well as their advantages over traditional methods. The methods are then demonstrated on production data.
Keywords
integrated circuit manufacture; production engineering computing; software tools; statistical analysis; fab tool commonalities; sort wafer maps; spatial patterns; statistical learning algorithms; Analysis of variance; Clustering algorithms; Libraries; Production facilities; Software algorithms; Software tools; Space technology; Statistical analysis; Statistical learning; Supervised learning;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location
Cambridge, MA
ISSN
1078-8743
Print_ISBN
978-1-4244-1964-7
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2008.4529051
Filename
4529051
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