Title :
A Batch Optimization Sofware for diffusion area scheduling in semiconductor manufacturing
Author :
Yugma, Claude ; Dauzère-Pérès, Stéphane ; Derreumaux, Alexandre ; Sibille, Olivier
Author_Institution :
Centre Microelectron. de Provence Site Georges Charpak, Ecole Nat. Super. des Mines de St.- Etienne, Gardanne
Abstract :
Semiconductor manufacturing processes are among the most complicated processes to manage. In this paper, we are interested in a problem of batching and scheduling in a diffusion area of ATMEL Rousset in France. This area contains a large number of lots to be processed and complex constraints to be satisfied. We present a decision-support system we implemented for the diffusion zone of ATMEL. The goal is to optimize batching and scheduling decisions at the diffusion area by developing fast and efficient solving procedures that optimize different performance measures while taking into account complex constraints. These procedures have been embedded in a decision-support system named batch optimization solver (BOS) that helps users at various decision levels. A prototype of BOS is currently being tested in the diffusion area of ATMEL.
Keywords :
decision support systems; optimisation; production control; scheduling; semiconductor device manufacture; batch optimization sofware; decision support system; diffusion area scheduling; semiconductor manufacturing; Area measurement; Constraint optimization; Fabrication; Job shop scheduling; Manufacturing processes; Production; Prototypes; Qualifications; Semiconductor device manufacture; Testing;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2008.4529063