Electrodeposited Co-Pt permanent magnet arrays on Cu[111]/Si[110] substrate

Summary form only given. Co-Pt alloy films are attractive candidates for integrated micromagnets, due to their potentially high anisotropy and the possibility of fabrication by patterned electrodeposition. Co/sub 80/Pt/sub 20/ films grow as a mixture of HCP and FCC phases, and their relative amount can be controlled through the electrolyte chemistry, the deposition conditions and the crystalline orientation of the substrate. In this work, Co/sub 80/Pt/sub 20/ micromagnets have been grown in optically defined micrometer scale patterns on Cu[111]/Si[110] substrate, in order to foster the epitaxial growth of hexagonal Co-Pt with the c-axis normal to the surface.