Title :
High resolution magnetic force microscopy using focussed ion beam modified tips
Author :
Phillips, G.N. ; Siekman, M. ; Abelmann, Leon ; Lodder, C.
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
Abstract :
Summary form only given. Magnetic force microscopy (MFM) is well established for imaging surface magnetic stray fields. With commercial microscopes and magnetic tips, images with 50 nm resolution are quite routine; however, obtaining higher resolutions is experimentally more demanding. Higher resolution is required for imaging patterned magnetic elements and the latest magnetic media where bit lengths are less than 40 nm. Sub-30 nm resolution images of a 20 bilayer Co/sub 50/Ni/sub 50//Pt thin film have been obtained using Si tips coated with Co and modified by focused ion beam (FIB) milling. Imaging was performed at room temperature, in air, with a Digital Instruments D13100 MFM in tapping/lift mode.
Keywords :
cobalt; cobalt alloys; ferromagnetic materials; focused ion beam technology; image resolution; magnetic force microscopy; magnetic multilayers; nickel alloys; platinum; silicon; surface magnetism; 30 nm; 300 K; 40 nm; Co/sub 50/Ni/sub 50/-Pt; Co/sub 50/Ni/sub 50//Pt thin film; Digital Instruments D13100 MFM; FIB; MFM; Si; Si tips; Si-Co; focused ion beam milling; focussed ion beam modified tips; high resolution magnetic force microscopy; image resolution; patterned magnetic elements; surface magnetic stray field imaging; Focusing; High-resolution imaging; Image resolution; Instruments; Ion beams; Magnetic force microscopy; Magnetic forces; Milling; Semiconductor thin films; Temperature;
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
DOI :
10.1109/INTMAG.2002.1000808
