DocumentCode
156663
Title
Precision material engineering — An equipment point of view
Author
Chang, Mingchao
Author_Institution
Appl. Mater., Sunnyvale, CA, USA
fYear
2014
fDate
28-30 April 2014
Firstpage
1
Lastpage
3
Abstract
Novel materials and specialty processes are expanding rapidly. Low power high performance devices 3D transistor, packaging and memory drove the demands. Innovation in new manufacturing methods/hardware and new chemistries are required to meet the challenges. Several examples in the past such as Cu metallization evolution and interface cleaning illustrate the efforts how the equipment vendor overcame the more demanding requirements by introducing more hardware control knobs (such as power, RF frequency, B field distribution, temperature zoning), introducing new chemicals (fine control chemical reaction pathway), new physical/chemistry methods (alternative energy form and source) and tempering with new elements. A proper implementation of advanced capabilities heavily depends on the applications. Better understanding of device integration and close working relationship with customers and suppliers can allow more targeted optimization with less iteration time.
Keywords
semiconductor device manufacture; semiconductor industry; semiconductor materials; 3D transistor; Cu metallization evolution; device integration; equipment vendor; hardware control knobs; interface cleaning; low power high performance devices; memory; novel materials; packaging; physical-chemistry methods; precision material engineering; specialty processes; Chemicals; Copper; Materials; Process control; Surface cleaning;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Design, Automation and Test (VLSI-DAT), 2014 International Symposium on
Conference_Location
Hsinchu
Type
conf
DOI
10.1109/VLSI-DAT.2014.6834926
Filename
6834926
Link To Document