DocumentCode :
1568401
Title :
TID and SEE Response of an Advanced Samsung 4Gb NAND Flash Memory
Author :
Oldham, Timothy R. ; Friendlich, Mark ; Howard, James W., Jr. ; Berg, Melanie D. ; Kim, Hak S. ; Irwin, Timithy L. ; LaBel, Kenneth A.
Author_Institution :
NASA, Greenbelt
Volume :
0
fYear :
2007
Firstpage :
221
Lastpage :
225
Abstract :
Initial total ionizing dose (TID) and single event heavy ion test results are presented for an unhardened commercial flash memory, fabricated with 63 nm technology. Results are that the parts survive to a TID of nearly 200 krad (SiCh), with a tractable soft error rate of about 10-12 errors/bit-day, for the Adams ten percent worst case environment.
Keywords :
NAND circuits; flash memories; ion beam effects; nanoelectronics; Samsung NAND flash memory; fabrication technology; nonvolatile memory; radiation effects; single event effects; single event heavy ion test; size 63 nm; total ionizing dose; tractable soft error rate; unhardened flash memory; Consumer electronics; Flash memory; Manufacturing; NASA; Nonvolatile memory; Power supplies; Radiation effects; Space technology; Testing; USA Councils; NAND flash; nonvolatile memory; radiation effects; single event effects (SEE); total ionizing dose (TID);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radiation Effects Data Workshop, 2007 IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-1464-2
Type :
conf
DOI :
10.1109/REDW.2007.4342570
Filename :
4342570
Link To Document :
بازگشت