DocumentCode
1570199
Title
What kinds of SOI wafers are suitable for what micromachining purposes?
Author
Kanda, Y.
Author_Institution
Hamamatsu Univ., Sch. of Med., Japan
fYear
1991
Firstpage
452
Lastpage
455
Abstract
SIMOX (separation by implanted oxygen), ZMR (zone melting recrystallization), and bonded SOI wafers are compared from the viewpoint of applications to sensors and actuators (S&A). These are whole wafers scale SOIs. Other local SOI technologies are discussed. It is noted that SOI wafers are especially attractive for smart power S&A, as each component is dielectrically isolated. Mobile elements such as diaphragm, cantilever, bridge, rotor, and valve can be fabricated by single-crystal silicon.<>
Keywords
diaphragms; electric actuators; electric sensing devices; elemental semiconductors; integrated circuit technology; ion implantation; micromechanical devices; recrystallisation; semiconductor technology; semiconductor-insulator boundaries; silicon; SIMOX; SOI wafers; Si-SiO/sub 2/; actuators; bonded wafers; bridge; cantilever; diaphragm; dielectrically isolated; elemental semiconductors; micromachining; mobile elements; rotor; sensors; single crystal Si; smart power; valve; whole wafers scale; zone melting recrystallization; Annealing; CMOS technology; Etching; Intelligent sensors; Isolation technology; Micromachining; Silicon on insulator technology; Temperature sensors; Thermal expansion; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-87942-585-7
Type
conf
DOI
10.1109/SENSOR.1991.148909
Filename
148909
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