Title :
Corner compensation techniques in anisotropic etching of
Author :
Sandmaier, H. ; Offereins, H.L. ; Kuhl, K. ; Lang, W.
Author_Institution :
Fraunhofer Inst. fur Festkorpertechnol., Munchen, Germany
Abstract :
Various compensation structures preventing the undercutting of convex corners of
Keywords :
compensation; electric sensing devices; elemental semiconductors; etching; micromechanical devices; silicon; KOH-H/sub 2/O solution; Si; anisotropic etching; compensation structures; corner compensation; elemental semiconductor; micromachining; orbiting V-grooves; rectangular solids; truncated pyramids; undercutting of convex corners; underetched geometries; Anisotropic magnetoresistance; Etching; Geometry; Mechanical systems; Micromachining; Micromechanical devices; Protection; Silicon; Solids; Testing;
Conference_Titel :
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-87942-585-7
DOI :
10.1109/SENSOR.1991.148910
