• DocumentCode
    1570483
  • Title

    Effect of different oxidation methods on microstructures and properties of AlO/sub x/ in magnetic tunnel junction

  • Author

    Jun Soo Bae ; Kyung Ho Shin ; Hyuck Mo Lee

  • Author_Institution
    Korea Advanced Institute of Science and Technology
  • fYear
    2002
  • Firstpage
    334
  • Lastpage
    334
  • Abstract
    Summary form only given. The AlOx tunnel barrier is a critical and sensitive layer in magnetic tunnel junctions (MTJ). The natural oxidation and the plasma oxidation methods are generally employed to fabricate this layer. In this study, the microstructures and properties of the AlOx layer formed by both methods were compared.
  • Keywords
    Artificial intelligence; Magnetic films; Magnetic properties; Magnetic tunneling; Materials science and technology; Microstructure; Oxidation; Plasma density; Plasma x-ray sources; Reflectivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
  • Conference_Location
    Amsterdam, The Netherlands
  • Print_ISBN
    0-7803-7365-0
  • Type

    conf

  • DOI
    10.1109/INTMAG.2002.1001177
  • Filename
    1001177
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1570483