DocumentCode :
1570483
Title :
Effect of different oxidation methods on microstructures and properties of AlO/sub x/ in magnetic tunnel junction
Author :
Jun Soo Bae ; Kyung Ho Shin ; Hyuck Mo Lee
Author_Institution :
Korea Advanced Institute of Science and Technology
fYear :
2002
Firstpage :
334
Lastpage :
334
Abstract :
Summary form only given. The AlOx tunnel barrier is a critical and sensitive layer in magnetic tunnel junctions (MTJ). The natural oxidation and the plasma oxidation methods are generally employed to fabricate this layer. In this study, the microstructures and properties of the AlOx layer formed by both methods were compared.
Keywords :
Artificial intelligence; Magnetic films; Magnetic properties; Magnetic tunneling; Materials science and technology; Microstructure; Oxidation; Plasma density; Plasma x-ray sources; Reflectivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
Type :
conf
DOI :
10.1109/INTMAG.2002.1001177
Filename :
1001177
Link To Document :
بازگشت