DocumentCode :
1570497
Title :
Computer simulation of magnetoresistance behavior in magnetic tunnel junctions exchange-biased by synthetic antiferromagnet
Author :
Uhm, Y.R. ; Lim, S.H.
Author_Institution :
Nano Device Res. Center, Korea Inst. of Sci. & Technol., Seoul, South Korea
fYear :
2002
Abstract :
Summary form only given. In a practical density level of MRAM utilizing magnetic tunnel junctions (MTJs), the cell dimensions are expected to be in the submicron range, where the switching of a magnetic layer is dominated by magnetostatic interactions, causing a significant increase of the switching fields. In particular, a large bias field resulting in a large switching field asymmetry is harmful in MRAM applications. In order to reduce the bias field, a synthetic antiferromagnet (SyAF), instead of a single antiferromagnet, is frequently used as a pinning material. The main focus of the present work is to examine the effects of cell dimensions and the relative Co layer thickness on the magnetoresistance characteristics of MTJs exchange-biased by SyAF.
Keywords :
aluminium compounds; antiferromagnetic materials; cobalt; exchange interactions (electron); iron alloys; magnetic multilayers; magnetic tunnelling; magnetostatics; nickel alloys; ruthenium; 0.7 nm; 7.5 nm; NiFe-AlO/sub x/-Co-Ru-Co; cell dimensions; exchange-biased; magnetic tunnel junctions; magnetoresistance behavior; relative Co layer thickness; synthetic antiferromagnet; Antiferromagnetic materials; Computer simulation; Electrodes; Electrons; Magnetic anisotropy; Magnetic field measurement; Magnetic tunneling; Magnetostatics; Perpendicular magnetic anisotropy; Tunneling magnetoresistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
Type :
conf
DOI :
10.1109/INTMAG.2002.1001178
Filename :
1001178
Link To Document :
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