Title :
Increased depth-of-field with numerically optimized general phase masks
Author :
Fraue, Yann ; Castro, Albertina
Author_Institution :
Inst. de Investig. en Mat. Aplic. y en Sist., Univ. Nac. Autonoma de Mexico, Mexico City
Abstract :
We propose a technique to optimize phase masks in order to increase the depth-of-field. The technique is based on cubic spline modeling of the phase and simulated annealing optimization.
Keywords :
masks; optical elements; simulated annealing; splines (mathematics); cubic spline modeling; depth-of-field; numerically optimized general phase masks; simulated annealing optimization; Optical imaging; Optical modulation; Performance analysis; Phase modulation; Polynomials; Proposals; Shape control; Simulated annealing; Spline; Transfer functions;
Conference_Titel :
IEEE Lasers and Electro-Optics Society, 2008. LEOS 2008. 21st Annual Meeting of the
Conference_Location :
Acapulco
Print_ISBN :
978-1-4244-1931-9
Electronic_ISBN :
978-1-4244-1932-6
DOI :
10.1109/LEOS.2008.4688641
