Title :
Influence of electrode structure on magneto transport in magnetic tunnel junctions
Author :
Wieldraaijer, H. ; LeClair, P. ; Kohlhepp, J.T. ; Swagten, H.J.M. ; de Jonge, W.J.M.
Author_Institution :
Dept. of Appl. Phys., Eindhoven Univ. of Technol., Netherlands
Abstract :
Summary form only given. Introduction The properties of magnetic tunnel junctions are heavily influenced by the electronic structure of the magnetic electrodes. Theoretically this has been well established for some time. Experimentally there have been few conclusive observations of this influence, which is mainly due to the need for tunneling electrodes with a well-known physical and electronic structure which can be modulated. In this study Co/Al/sub 2/O/sub 3//Co junctions have been prepared with differently textured Co layers, by dc/rf magnetron sputtering on either FeMn- or Ta-buffer layers. The local physical structure of the electrodes is investigated directly by /sup 59/Co Nuclear Magnetic Resonance (NMR) in combination with X-Ray Diffraction (XRD).
Keywords :
X-ray diffraction; alumina; cobalt; electronic structure; magnetic multilayers; nuclear magnetic resonance; sputtered coatings; tunnelling magnetoresistance; Co-Al/sub 2/O/sub 3/-Co; FeMn; NMR; Ta; X-ray diffraction; electronic structure; local physical structure; magnetic electrodes; magnetic tunnel junctions; magnetotransport; magnetron sputtering; textured layers; Artificial intelligence; Electrodes; Magnetic properties; Magnetic tunneling; Magnetosphere; Nuclear magnetic resonance; Oxidation; Sputtering; Surface resistance; Tunneling magnetoresistance;
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
DOI :
10.1109/INTMAG.2002.1001184
