DocumentCode
1570714
Title
Reorientation of the magnetization in compensated F/AF bilayers
Author
Silva, Marcelo L. ; Dantas, A.L. ; Carrico, A.S.
Author_Institution
Dept. de Fisica, Univ. Fed. do Rio Grande do Norte, Natal, Brazil
fYear
2002
Abstract
Summary form only given. We study interface effects in the magnetic phases of a ferromagnetic film grown on a compensated antiferromagnetic substrate. We consider ferromagnetic films with either uniaxial or crystalline four-fold anisotropy. For uniaxial ferromagnetic films, we find that the frustration induced by the interface exchange leads to a reorientation of the magnetization only if the strength of the interface field is beyond a certain threshold value which is thickness dependent. For ferromagnetic films with four-fold crystalline anisotropy the reorientation of the magnetization occurs for any value the interface exchange field strength. For antiferromagnetic substrates with large uniaxial anisotropy field, the reorientation of the magnetization produces minor changes in the antiferromagnetic arrangement of the spins in each plane. The theoretical model is applied to Fe/FeF/sub 2/ and Fe/MnF/sub 2/ bilayers.
Keywords
antiferromagnetic materials; exchange interactions (electron); ferromagnetic materials; iron; iron compounds; magnetic anisotropy; magnetic hysteresis; magnetic multilayers; magnetisation reversal; manganese compounds; Fe-FeF/sub 2/; Fe-MnF/sub 2/; Fe/FeF/sub 2/ bilayers; Fe/MnF/sub 2/ bilayers; compensated antiferromagnetic substrate; exchange bias field; ferromagnetic film; film thickness dependence; four-fold crystalline anisotropy; hysteresis curve shift; interface effects; magnetization reorientation; uniaxial anisotropy; Anisotropic magnetoresistance; Antiferromagnetic materials; Crystallization; Iron; Magnetic anisotropy; Magnetic films; Magnetic materials; Magnetization; Perpendicular magnetic anisotropy; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location
Amsterdam, The Netherlands
Print_ISBN
0-7803-7365-0
Type
conf
DOI
10.1109/INTMAG.2002.1001191
Filename
1001191
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