Title :
The influence of cross-tie wall on the magnetoresistance of patterned Permalloy films
Author :
Wu, J.C. ; Lee, H.M.
Author_Institution :
Dept. of Phys., Nat. Changhua Univ. of Educ., Taiwan
Abstract :
Summary form only given. Driven by the potential applications in data storage and the understanding of the fundamental micromagnetism, nanostructured magnetic thin films have been under intensive investigation. The recent advances in the nanofabrication and microscopy of the magnetic domain structures have led to more optimization of the magnetic field sensors. We present a correlation between the magnetization evolution in patterned elliptical Permalloy elements and their corresponding magnetoresistance (MR).
Keywords :
Permalloy; ferromagnetic materials; magnetic domain walls; magnetic thin films; magnetisation; magnetoresistance; nanostructured materials; Fe-Ni; cross-tie wall; magnetic domain structures; magnetic field sensors; magnetization evolution; magnetoresistance; micromagnetism; nanofabrication; nanostructured magnetic thin films; patterned Permalloy films; Laboratories; Lithography; Magnetic domains; Magnetic field measurement; Magnetic films; Magnetic force microscopy; Magnetic sensors; Magnetoresistance; Physics; Saturation magnetization;
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
DOI :
10.1109/INTMAG.2002.1001217
