Direct magnetic patterning of non-magnetic Co/C thin films by electron-beam radiation

Author

Zhou, T.J. ; Zhao, Y. ; Wang, J.P. ; Chong, T.C. ; Thong, J.T.L.

Author_Institution

Data Storage Inst., Singapore, Singapore

fYear

2002

Abstract

Summary form only given. Conventional electron beam lithography (EBL) has been used for fabricating patterned nanostructure, however, it involves the cumbersome process of resist coating, etching, lift-off, etc., which greatly complicates the production of patterned nanostructures. Mask-assistant ion beam mixing of multilayer films has been proposed but demonstrated low-resolution. A novel method involving direct magnetic patterning of a non-magnetic film by e-beam radiation induced nano-scale phase change is proposed in this paper, and preliminary results are presented. Metastable amorphous Co-C thin films were selected for this study.

Keywords

amorphous magnetic materials; carbon; cobalt; electron beam lithography; ferromagnetic materials; magnetic thin films; nanostructured materials; pattern formation; 30 to 60 nm; Co-C; direct magnetic patterning; electron-beam radiation; nonmagnetic Co/C thin films; patterned nanostructure; Amorphous magnetic materials; Coatings; Electron beams; Etching; Ion beams; Lithography; Magnetic films; Magnetic multilayers; Production; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International

Conference_Location

Amsterdam, The Netherlands

Print_ISBN

0-7803-7365-0

Type

conf

DOI

10.1109/INTMAG.2002.1001308

Filename

1001308