• DocumentCode
    1573446
  • Title

    Optimized pulsed laser deposition of manganite thin films from a shock wave (p-d) scaling law

  • Author

    Haghiri-Gosnet, A.M. ; Koubaa, M. ; Desfeux, R. ; Lecoeur, P. ; Prellier, W. ; Mercey, B.

  • Author_Institution
    Inst. d´Electron. Fondamentale, Univ. de Paris-Sud, Orsay, France
  • fYear
    2002
  • Abstract
    Summary form only given. The investigation into optimizing the parameters of pulsed laser deposited La/sub 0.7/Sr/sub 0./3MnO/sub 3/ (LSMO) thin films, has resulting in the discovery of a strong correlation between the target-to-substrate distance d and the oxygen pressure p(O/sub 2/). The optimal distance d/sub opt/ for each p(O/sub 2/) is calculated from a scaling law (Geohegan 1992) in accordance with the shock wave model results in films with high structural and oxygen pressure magnetic properties. d/sub opt/ is also shown to fit the plume range L/sub 0/, defined by Strikovski et al. (1998) as the distance for which species start to be thermalized in the plasma. The morphology and the microstructure of LSMO films deposited, under different p(O/sub 2/) and d, are analyzed using X-ray diffraction and atomic force microscopy. The epitaxial strain is varied using the two substrates SrTiO/sub 3/ and LaAlO/sub 3/. The magnetic anisotropy is determined at RT by the magneto optical Kerr effect (MOKE).
  • Keywords
    Kerr magneto-optical effect; X-ray diffraction; atomic force microscopy; internal stresses; lanthanum compounds; magnetic anisotropy; magnetic thin films; pulsed laser deposition; shock wave effects; strontium compounds; 300 K; LSMO thin film; La/sub 0.7/Sr/sub 0.3/MnO/sub 3/; LaAlO/sub 3/; MOKE; SrTiO/sub 3/; X-ray diffraction; atomic force microscopy; epitaxial strain; film microstructure; film morphology; magnetic anisotropy; magneto optical Kerr effect; manganite thin films; optimized pulsed laser deposition; oxygen pressure effect; plume range; shock wave scaling law; target-to-substrate distance; Atomic force microscopy; Magnetic anisotropy; Magnetic films; Optical pulses; Optimized production technology; Pulsed laser deposition; Shock waves; Sputtering; Strontium; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
  • Conference_Location
    Amsterdam, The Netherlands
  • Print_ISBN
    0-7803-7365-0
  • Type

    conf

  • DOI
    10.1109/INTMAG.2002.1001330
  • Filename
    1001330