DocumentCode
1573549
Title
Large-area linear and nonlinear nanophotonics
Author
Brueck, S.R.J.
Author_Institution
Center for High Technol. Mater., Univ. of New Mexico, Albuquerque, NM
fYear
2008
Firstpage
660
Lastpage
660
Abstract
Interferometric lithography provides a facile technique for the fabrication of large-areas of nanophotonic structures. Examples of both linear and nonlinear responses will be drawn from plasmonics, metamaterials, and photonic crystals.
Keywords
light interferometry; metamaterials; nanofabrication; nanolithography; nanophotonics; nonlinear optics; photolithography; photonic crystals; plasmonics; interferometric lithography; linear nanophotonic structures; metamaterials; nonlinear nanophotonics; photonic crystals; plasmonics; High speed optical techniques; Interferometric lithography; Metamaterials; Nanophotonics; Nonlinear optics; Optical harmonic generation; Optical interferometry; Optical ring resonators; Photonic crystals; Plasmons; metamaterials; nanophotonics; photonic crystal; plasmonics;
fLanguage
English
Publisher
ieee
Conference_Titel
IEEE Lasers and Electro-Optics Society, 2008. LEOS 2008. 21st Annual Meeting of the
Conference_Location
Acapulco
Print_ISBN
978-1-4244-1931-9
Electronic_ISBN
978-1-4244-1932-6
Type
conf
DOI
10.1109/LEOS.2008.4688791
Filename
4688791
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