Title :
2D electronic systems for device applications
Author_Institution :
Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Abstract :
In the author´s presentation, the author will focus on devices from MoS2. The author will discuss why di-chalgogenides are not “yet another” new material class, but instead offer true advantages towards electronic applications. In particular the author´s work will elucidate the impact of contacts in case of MoS2 field-effect transistors. Through a thorough study of the impact of various contact source/drain metal electrodes and layer thickness on the “effective” mobility of MoS2 devices, they were able to gather critical insights into the electronic properties of this di-chalcogenide. This study supports in particular the notion that an apparently linear device Id-Vds characteristic is by no means evidence of an Ohmic contact and that contacts frequently mask the true mobility specs of novel low-dimensional materials. Moreover, the study on the impact of the layer thickness reveals important information about the usefulness of multi-layered structures for improved device performance and helps to understand how interlayer resistances and screening between individual MoS2 layers determine the overall device performance. Evaluating the resistor network that is used to describe the properties of multi-layer MoS2 and comparing the individual resistor components with those in other materials such as graphene allows us to gain a detailed understanding about the distribution of the electrical current in 2D layered materials. This understanding is believed to be a key aspect to determine the layout and design of future generations of devices from low-dimensional structures.
Keywords :
carrier mobility; electrodes; field effect transistors; graphene; molybdenum compounds; multilayers; 2D electronic systems; 2D layered materials; C; MoS2; contact source-drain metal electrodes; device applications; di-chalgogenides; effective mobility; electrical current; electronic properties; field-effect transistors; graphene; interlayer resistances; low-dimensional materials; multilayered structures; screening; Carbon nanotubes; Computers; Educational institutions; Graphene; Materials; Performance evaluation; Resistors;
Conference_Titel :
Device Research Conference (DRC), 2013 71st Annual
Conference_Location :
Notre Dame, IN
Print_ISBN :
978-1-4799-0811-0
DOI :
10.1109/DRC.2013.6633779