DocumentCode :
1574781
Title :
Optimization of the electron hole bilayer tunneling field effect transistor
Author :
Agarwal, Sankalp ; Teherani, James T. ; Hoyt, Judy L. ; Antoniadis, Dimitri A. ; Yablonovitch, Eli
Author_Institution :
Univ. of California, Berkeley, Berkeley, CA, USA
fYear :
2013
Firstpage :
109
Lastpage :
110
Abstract :
In order to reduce the power consumption of modern electronics, the operating voltage needs to be significantly reduced. The electron hole bilayer tunneling field effect transistor (bilayer TFET) has the potential for reduced voltage operation. [1, 2] The device structure is shown in Fig. 1. Recent simulations of the bilayer TFET show poor on-state current [1] and electrostatic gate efficiency [2]. In this work we propose a new biasing scheme to improve gate efficiency by exploiting quantum capacitance and create a new model to analyze the tradeoff between gate efficiency and on-state current to find the optimal device design.
Keywords :
MOSFET; capacitance; optimisation; semiconductor device models; biasing scheme; electron hole bilayer tunneling field effect transistor; gate efficiency; on-state current; optimal device design; optimization; power consumption; quantum capacitance; voltage operation reduction; Conductivity; Integrated circuit modeling; Logic gates; Quantum capacitance; Silicon; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2013 71st Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4799-0811-0
Type :
conf
DOI :
10.1109/DRC.2013.6633817
Filename :
6633817
Link To Document :
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