DocumentCode :
1574832
Title :
I-NPN: A sub-60mV/decade, sub-0.6V selection diode for STTRAM
Author :
Deshmukh, S. ; Lashkare, S. ; Rajendran, Bipin ; Ganguly, Utsav
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol., Mumbai, Mumbai, India
fYear :
2013
Firstpage :
113
Lastpage :
114
Abstract :
In this paper, we propose a new 2 terminal selection device for STTRAM at 0.6 V, with high on current (>10MA/cm2) and high on-off ratio (104). STTRAM has recently been proposed as an SRAM alternative with fast program erase (0.5-5ns) and low voltage (0.2V) and high-current (<;20MA/cm2) [1]. An epitaxial Si NPN structure has been explored by simulations for greater than 1.5V operation [2] and experimentally demonstrated [3-4], which is very high voltage for STTRAM. E.g. for efficient cross-point, the selector threshold voltage (VT) must be slightly above set voltage (Vset) of STTRAM (or any bipolar RRAM) as shown in Fig. 1. If the STTRAM has Vset=0.2V and Iset=20MA/cm2, (a) for successful set/reset operation, the selector needs to pass on current (Ion=Iset) at VT=0.6V for a cross-point voltage V=VT+Vset=0.8V (same as VDd for compatibility with SRAM power supply). (b) For low off current at cross-point voltage V/2=0.4V, the voltage must drop mainly across the selector which will pass off-current (Ioff) such that Ion/Ioff is high (~104). Thus, a steep sub-threshold slope (SS) is required for Ion/Ioff modulation in VT-V/2=0.2V which implies that SS<;50mV/decade. Thus such a selector has 3 requirements for STTRAM replacement of SRAM, (i) on-voltage <;0.6V, (ii) on-current density >20MA/cm2 and (iii) SS <;50mV/decade. In this paper, we present the concept and explore the performance of such a selector for STTRAM/bipolar RRAM.
Keywords :
bipolar memory circuits; epitaxial growth; impact ionisation; random-access storage; semiconductor diodes; silicon; I-NPN; SRAM; STTRAM; Si; bipolar RRAM; cross-point voltage; epitaxial Si NPN structure; on-current density; on-voltage; selection diode; selector threshold voltage; subthreshold slope; voltage 0.2 V; voltage 0.6 V; voltage 0.8 V; Doping; Electric fields; Impact ionization; Random access memory; Semiconductor process modeling; Threshold voltage; Transient analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2013 71st Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4799-0811-0
Type :
conf
DOI :
10.1109/DRC.2013.6633819
Filename :
6633819
Link To Document :
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