• DocumentCode
    1574884
  • Title

    Exfoliated MoTe2 field-effect transistor

  • Author

    Fathipour, S. ; Wan Sik Hwang ; Kosel, T. ; Xing, Huili Grace ; Haensch, Wilfried ; Jena, D. ; Seabaugh, Alan

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • fYear
    2013
  • Firstpage
    115
  • Lastpage
    116
  • Abstract
    Transition metal dichalcogenides (TMD) are materials with the form MX2 where M is a metal and X can be Se, S, or Te. These materials have covalent bonding within the layers and Van der Waals bonding between the layers [1]. Unlike graphene, the existence of a band gap eliminates the need to form nanoribbons for two-dimensional crystal tunnel field-effect transistors (TFETs). Among TMDs, molybdenum ditelluride MoTe2 has the lowest band gap (1 eV) which makes it highly suitable for TFET application. In this paper, we report the first fabrication and electrical characteristics of a MoTe2 FET, made on exfoliated multilayer crystals.
  • Keywords
    field effect transistors; molybdenum compounds; semiconductor materials; MoTe2; TFET; band gap; covalent bonding; electrical characteristics; exfoliated MoTe2 field-effect transistor; exfoliated multilayer crystals; fabrication; molybdenum ditelluride; transition metal dichalcogenides; tunnel field-effect transistors; van der Waals bonding; Aluminum oxide; Crystals; Lattices; Logic gates; Nonhomogeneous media; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2013 71st Annual
  • Conference_Location
    Notre Dame, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4799-0811-0
  • Type

    conf

  • DOI
    10.1109/DRC.2013.6633820
  • Filename
    6633820