DocumentCode
1576293
Title
Closed-form solution for cycle time of revisiting processes in single-arm cluster tool scheduling with atomic layer deposition
Author
Sun, YuXi ; Wu, NaiQi ; Zhou, MengChu
Author_Institution
Sch. of Mechatron. Eng., Guangdong Univ. of Technol., Guangzhou, China
fYear
2011
Firstpage
377
Lastpage
382
Abstract
Atomic layer deposition (ALD) is a typical process with wafer revisiting that should be performed by cluster tools. This paper discusses the scheduling problem of single-arm cluster tools for the ALD process. In scheduling such system, the most difficult part is to schedule the revisiting process and obtain its optimal cycle time. This paper studies the revisiting process of ALD with revisiting times k = 3, 4, and 5. Analytical expressions are obtained to calculate the cycle time for the k possible schedules with k = 3, 4, and 5, respectively, so as to obtain the optimal one. In this way, the scheduling problem of such a revisiting process becomes simple and this is a significant improvement in scheduling cluster tools with wafer revisiting.
Keywords
atomic layer deposition; production control; atomic layer deposition; closed-form solution; optimal cycle time; scheduling cluster tool; single-arm cluster tool scheduling; wafer revisiting process; Color; Integrated circuit modeling; Load modeling; Robots; Schedules; Semiconductor device modeling; System recovery;
fLanguage
English
Publisher
ieee
Conference_Titel
Networking, Sensing and Control (ICNSC), 2011 IEEE International Conference on
Conference_Location
Delft
Print_ISBN
978-1-4244-9570-2
Type
conf
DOI
10.1109/ICNSC.2011.5874923
Filename
5874923
Link To Document