• DocumentCode
    1576293
  • Title

    Closed-form solution for cycle time of revisiting processes in single-arm cluster tool scheduling with atomic layer deposition

  • Author

    Sun, YuXi ; Wu, NaiQi ; Zhou, MengChu

  • Author_Institution
    Sch. of Mechatron. Eng., Guangdong Univ. of Technol., Guangzhou, China
  • fYear
    2011
  • Firstpage
    377
  • Lastpage
    382
  • Abstract
    Atomic layer deposition (ALD) is a typical process with wafer revisiting that should be performed by cluster tools. This paper discusses the scheduling problem of single-arm cluster tools for the ALD process. In scheduling such system, the most difficult part is to schedule the revisiting process and obtain its optimal cycle time. This paper studies the revisiting process of ALD with revisiting times k = 3, 4, and 5. Analytical expressions are obtained to calculate the cycle time for the k possible schedules with k = 3, 4, and 5, respectively, so as to obtain the optimal one. In this way, the scheduling problem of such a revisiting process becomes simple and this is a significant improvement in scheduling cluster tools with wafer revisiting.
  • Keywords
    atomic layer deposition; production control; atomic layer deposition; closed-form solution; optimal cycle time; scheduling cluster tool; single-arm cluster tool scheduling; wafer revisiting process; Color; Integrated circuit modeling; Load modeling; Robots; Schedules; Semiconductor device modeling; System recovery;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Networking, Sensing and Control (ICNSC), 2011 IEEE International Conference on
  • Conference_Location
    Delft
  • Print_ISBN
    978-1-4244-9570-2
  • Type

    conf

  • DOI
    10.1109/ICNSC.2011.5874923
  • Filename
    5874923