DocumentCode :
1576674
Title :
Can we engineer current saturation in narrow gap graphitic FETs without hurting mobility?
Author :
Tseng, Fan-Shuo ; Fiori, G. ; Ghosh, Avik W.
Author_Institution :
ECE, Univ. of Virginia, Charlottesville, VA, USA
fYear :
2013
Firstpage :
1
Lastpage :
2
Abstract :
While a wide bandgap material with poor mobility can saturate the output current, we demonstrate a way to achieve clear current saturation in the output characteristics using narrow-bandgap, high mobility graphitic-channels(Fig.4b, 4c) without hurting the mobility. Using gate engineering alone, we preserve the intrinsic narrow bandgap but locally cascade them along the channel. This filters intermediate conduction and valence bands and widens the gap in the tranmission (Fig.3) without sacrificing mobility. A widen transmission gap delays the onset of band-to-band tunneling, which normally plagues devices with a narrow bandgap channel. Results are verified using an optimized fully atomistic non-equilibrium Green´s Function(NEGF) solver with complex 3-D Poisson1. A graphitic channel is used as a template but is one of many possible narrow-bandgap materials with high mobility. Without hurting mobility, the improved current saturation is expected to enhance gain for radio frequency(RF) and potentially digital switching applications by significantly decreasing output conductance(gds)2.
Keywords :
Green´s function methods; conduction bands; field effect transistors; graphite; narrow band gap semiconductors; tunnelling; valence bands; C; band-to-band tunneling; complex 3-D Poisson; conduction bands; current saturation; digital switching applications; gate engineering; high mobility graphitic-channels; intrinsic narrow bandgap; narrow gap graphitic FET; narrow-bandgap channels; optimized fully atomistic nonequilibrium Green´s function solver; output characteristics; output conductance; radio frequency gain; tranmission gap; valence bands; Graphene; Logic gates; Materials; Photonic band gap; Resistance; Switches; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2013 71st Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4799-0811-0
Type :
conf
DOI :
10.1109/DRC.2013.6633886
Filename :
6633886
Link To Document :
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