• DocumentCode
    1576674
  • Title

    Can we engineer current saturation in narrow gap graphitic FETs without hurting mobility?

  • Author

    Tseng, Fan-Shuo ; Fiori, G. ; Ghosh, Avik W.

  • Author_Institution
    ECE, Univ. of Virginia, Charlottesville, VA, USA
  • fYear
    2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    While a wide bandgap material with poor mobility can saturate the output current, we demonstrate a way to achieve clear current saturation in the output characteristics using narrow-bandgap, high mobility graphitic-channels(Fig.4b, 4c) without hurting the mobility. Using gate engineering alone, we preserve the intrinsic narrow bandgap but locally cascade them along the channel. This filters intermediate conduction and valence bands and widens the gap in the tranmission (Fig.3) without sacrificing mobility. A widen transmission gap delays the onset of band-to-band tunneling, which normally plagues devices with a narrow bandgap channel. Results are verified using an optimized fully atomistic non-equilibrium Green´s Function(NEGF) solver with complex 3-D Poisson1. A graphitic channel is used as a template but is one of many possible narrow-bandgap materials with high mobility. Without hurting mobility, the improved current saturation is expected to enhance gain for radio frequency(RF) and potentially digital switching applications by significantly decreasing output conductance(gds)2.
  • Keywords
    Green´s function methods; conduction bands; field effect transistors; graphite; narrow band gap semiconductors; tunnelling; valence bands; C; band-to-band tunneling; complex 3-D Poisson; conduction bands; current saturation; digital switching applications; gate engineering; high mobility graphitic-channels; intrinsic narrow bandgap; narrow gap graphitic FET; narrow-bandgap channels; optimized fully atomistic nonequilibrium Green´s function solver; output characteristics; output conductance; radio frequency gain; tranmission gap; valence bands; Graphene; Logic gates; Materials; Photonic band gap; Resistance; Switches; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2013 71st Annual
  • Conference_Location
    Notre Dame, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4799-0811-0
  • Type

    conf

  • DOI
    10.1109/DRC.2013.6633886
  • Filename
    6633886