DocumentCode
1579447
Title
Dimensional metrology of NPL photomask standards
Author
McCarthy, M.B.
Author_Institution
Nat. Phys. Lab., Teddington, UK
fYear
1995
fDate
11/30/1995 12:00:00 AM
Firstpage
42614
Lastpage
42618
Abstract
This paper describes measuring machines, tools and calibration techniques developed at the National Physical Laboratory (NPL) for the calibration of optical metrology standards. Such standards include one dimensional line pitch and linewidth scales, two dimensional photomasks plates (X-Y), circular optical fibres and reference stage graticules used for the calibration of image analysers. Specific details are given on the design of a fully automatic length measuring machine (400 mm machine) having an absolute accuracy of 1 part in 107 and modifications to a commercial photomask comparator are presented. Individual results from these measuring machines are plotted and their mathematical combination which has resulted in a state of the art capability for the calibration of seven inch two-dimensional photomask standards (uncertainty of 8 parts in 107) is discussed
Keywords
calibration; length measurement; masks; measurement standards; photolithography; National Physical Laboratory standards; X-Y position standard; automatic length measuring machine; calibration techniques; circular optical fibres; commercial photomask comparator; dimensional metrology; image analysers; linewidth scales; measuring machines; one dimensional line pitch scales; optical length standards; optical metrology standards; photomask standards; reference stage graticules; two dimensional photomask plates;
fLanguage
English
Publisher
iet
Conference_Titel
Methods of Materials Measurement in Microengineering, IEE Colloquium on
Conference_Location
London
Type
conf
DOI
10.1049/ic:19951471
Filename
497055
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