• DocumentCode
    1580579
  • Title

    Scanner focus and CD response characterization metrology for sub 180 nm lithography

  • Author

    Putnam, Christopher ; Magoon, Holly ; Alam, Muhammad ; Beaumont, Shelley ; Fruga, Catherine ; Leung, Frank ; Morita, Etsuya ; Pierce, Ronald ; Roberts, Norman

  • Author_Institution
    Nikon Precision Inc., Belmont, CA, USA
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Firstpage
    381
  • Lastpage
    389
  • Abstract
    The rapid pace in scanner technology has produced a situation where many process layers will have to be manufactured with a minimum depth of focus (DOF) of approximately 0.3 um with very stringent critical dimension (CD) control. This paper explores the application of Optical Critical Dimension (formerly called OCD, now MX-SMP) technology to measure and evaluate focus in addition to the CD response across the wafer.
  • Keywords
    optical focusing; optical scanners; spatial variables measurement; ultraviolet lithography; 180 nm; DUV lithography; MX-SMP; critical dimension control; depth of focus; optical critical dimension metrology; optical scanner; Focusing; Isolation technology; Lenses; Lithography; Manufacturing processes; Metrology; Monitoring; Scanning electron microscopy; Testing; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
  • Print_ISBN
    0-7803-7158-5
  • Type

    conf

  • DOI
    10.1109/ASMC.2002.1001638
  • Filename
    1001638
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1580579