Title :
Scanner focus and CD response characterization metrology for sub 180 nm lithography
Author :
Putnam, Christopher ; Magoon, Holly ; Alam, Muhammad ; Beaumont, Shelley ; Fruga, Catherine ; Leung, Frank ; Morita, Etsuya ; Pierce, Ronald ; Roberts, Norman
Author_Institution :
Nikon Precision Inc., Belmont, CA, USA
fDate :
6/24/1905 12:00:00 AM
Abstract :
The rapid pace in scanner technology has produced a situation where many process layers will have to be manufactured with a minimum depth of focus (DOF) of approximately 0.3 um with very stringent critical dimension (CD) control. This paper explores the application of Optical Critical Dimension (formerly called OCD, now MX-SMP) technology to measure and evaluate focus in addition to the CD response across the wafer.
Keywords :
optical focusing; optical scanners; spatial variables measurement; ultraviolet lithography; 180 nm; DUV lithography; MX-SMP; critical dimension control; depth of focus; optical critical dimension metrology; optical scanner; Focusing; Isolation technology; Lenses; Lithography; Manufacturing processes; Metrology; Monitoring; Scanning electron microscopy; Testing; Time measurement;
Conference_Titel :
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN :
0-7803-7158-5
DOI :
10.1109/ASMC.2002.1001638
