• DocumentCode
    1583214
  • Title

    Optimization of quarter micron MOSFETs for low voltage/low power applications

  • Author

    Chen, Zongjian ; Burr, Jim ; Shott, John ; Plummer, James D.

  • Author_Institution
    Center for Integrated Syst., Stanford Univ., CA, USA
  • fYear
    1995
  • Firstpage
    63
  • Lastpage
    66
  • Abstract
    A case study of MOSFET technology optimization for low voltage (1 V), low power applications is presented. Technology parameters (threshold voltage, oxide thickness) were optimized for power and speed with the consideration of balancing switching power and static power dissipation and the impact of process/ambient variation. Well and substrate ties were separated from supply rails and controlled separately to compensate for process and ambient variations. For the same switching speed, fabricated devices show a 4.5× reduction in switching power when compared with standard devices operated at a higher supply voltage. An implementation of a self tuning system using the low/tunable threshold device in a VLSI environment is presented
  • Keywords
    MOSFET; VLSI; circuit optimisation; circuit tuning; semiconductor technology; 0.25 mum; 1 V; MOSFET technology optimization; VLSI environment; low power applications; low tunable threshold device; low voltage; oxide thickness; process/ambient variation effects; self tuning system; static power dissipation; substrate ties; switching power; threshold voltage; well ties; Implants; Low voltage; MOSFETs; Numerical analysis; Power dissipation; Rails; Temperature control; Threshold voltage; Tunable circuits and devices; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1995. IEDM '95., International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2700-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1995.497183
  • Filename
    497183