Title :
Capacitor and coupled inductor with high process tolerance in LTCC
Author :
Lu, Hsin-Chia ; Chao, Tzu-Wei
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei
Abstract :
A new structure of capacitor and coupled multilayer inductor that can tolerate the misalignment between layers in LTCC process up to 50 mum are proposed. Simulation results show that proposed coupled inductor has much better resistance to process misalignment than traditional straight line coupled inductors
Keywords :
capacitors; ceramics; inductors; LTCC; capacitor; coupled inductor; process misalignment; Band pass filters; Capacitance; Capacitors; Coupling circuits; Equivalent circuits; Inductance; Inductors; Nonhomogeneous media; Shape; Topology; LTCC; coupled inductor; layer-to-layer misalignment;
Conference_Titel :
Microsystems, Packaging, Assembly Conference Taiwan, 2006. IMPACT 2006. International
Conference_Location :
Taipei
Print_ISBN :
1-4244-0735-4
Electronic_ISBN :
1-4244-0735-4
DOI :
10.1109/IMPACT.2006.312188
