Fabrication and optimization of planar defects embedded between two silica opals

Author

Bourdillon, C. ; Phan Ngoc Hong ; Gam-Derouich, S. ; Benalloul, P. ; Coolen, L. ; Maitre, A. ; Faure, M.-C. ; Goldmann, M. ; Schwob, C.

Author_Institution

INSP, UPMC Univ. Paris 06, Paris, France

fYear

2015

Firstpage

1

Lastpage

4

Abstract

We present a versatile and efficient way to engineer a planar defect layer between two opal-based photonic crystals, leading to the appearance of a passband within the photonic stopband. The optimization of the planar defect parameters, necessary to preserve the high crystallographic order of the hetero-structures, is deduced from 1D-simulations of reflection spectra.

Keywords

nanofabrication; nanostructured materials; photonic crystals; refractive index; silicon compounds; 1D simulation; SiO₂; high crystallographic heterostructure order; nanostructured material; opal-based photonic crystals; optimization; passband appearance; photonic stopband; planar defect layer; reflection spectra; refractive index; silica opals; Indexes; Photonic crystals; Photonics; Reflection; Scanning electron microscopy; Silicon compounds; Spectroscopy; 1D simulations; Langmuir-Blodgett technique; inverse Schaefer technique; photonic crystal; planar defect; specular reflection spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks (ICTON), 2015 17th International Conference on

Conference_Location

Budapest

Type

conf

DOI

10.1109/ICTON.2015.7193327

Filename

7193327