Title :
Fabrication and optimization of planar defects embedded between two silica opals
Author :
Bourdillon, C. ; Phan Ngoc Hong ; Gam-Derouich, S. ; Benalloul, P. ; Coolen, L. ; Maitre, A. ; Faure, M.-C. ; Goldmann, M. ; Schwob, C.
Author_Institution :
INSP, UPMC Univ. Paris 06, Paris, France
Abstract :
We present a versatile and efficient way to engineer a planar defect layer between two opal-based photonic crystals, leading to the appearance of a passband within the photonic stopband. The optimization of the planar defect parameters, necessary to preserve the high crystallographic order of the hetero-structures, is deduced from 1D-simulations of reflection spectra.
Keywords :
nanofabrication; nanostructured materials; photonic crystals; refractive index; silicon compounds; 1D simulation; SiO2; high crystallographic heterostructure order; nanostructured material; opal-based photonic crystals; optimization; passband appearance; photonic stopband; planar defect layer; reflection spectra; refractive index; silica opals; Indexes; Photonic crystals; Photonics; Reflection; Scanning electron microscopy; Silicon compounds; Spectroscopy; 1D simulations; Langmuir-Blodgett technique; inverse Schaefer technique; photonic crystal; planar defect; specular reflection spectroscopy;
Conference_Titel :
Transparent Optical Networks (ICTON), 2015 17th International Conference on
Conference_Location :
Budapest
DOI :
10.1109/ICTON.2015.7193327
